SEMI Publishes Eight New Technical Standards

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SEMI Publishes Eight New Technical Standards
     Documents Provide Cost Savings in FPD, Semiconductor Manufacturing

    SAN JOSE, Calif., June 2 /PRNewswire/ -- SEMI has published eight new
technical standards applicable to the semiconductor, flat panel display
(FPD) and MEMS manufacturing industries. The new standards, developed by
technical experts from equipment suppliers, device manufacturers and other
companies participating in the SEMI International Standards Program, are
available for purchase in CD-ROM format or can be downloaded from the SEMI
website, http://www.semi.org.
    SEMI Standards are published three times a year. The new standards,
part of the July 2006 publication cycle, join more than 720 standards that
have been published by SEMI during the past 33 years.
    The standards include safety guidelines for hydrogen peroxide storage
and handling systems, specifications for critical dimension (CD)
measurement information data for photomask manufacturing, and test methods
for measurement of the resistivity of resin black matrix for LCD color
filters.
    "These new standards, which include several specifications applicable
to the flat panel display (FPD) manufacturing industry, will help reduce
manufacturing costs and speed time-to-market," said Bettina Weiss, SEMI
director of International Standards.
    The new standards released today include:
    SEMI D44
    Specification for Reference Position of Single Substrate for Handing
Off on Tool
    SEMI D45
    Test Methods for Measurement of Resistivity of Resin Black Matrix for
LCD Color Filters
    SEMI D46
    Terminology for FPD Polarizing Films

    SEMI E139.2
    SECS-II Protocol for Recipe and Parameter Management (RaP)

    SEMI M66
    Test Method for Effective Work Function Extraction in Oxide and High-K
Gate Stacks Using the MIS Flat Band Voltage-Insulator Thickness Technique
    SEMI P46
    Specification for Critical Dimension (CD) Measurement Information Data
on Photomask by XML
    SEMI S25
    Safety Guideline for Hydrogen Peroxide Storage and Handling Systems

    SEMI T17
    Specification for Substrate Traceability
    In addition to the above standards, the SEMI S2 safety specification is
being updated with additional and corrected material from the last two
years. This version of SEMI S2 is the first in a planned tri-annual
revision process, with the next SEMI S2 update scheduled for 2009.
    The SEMI Standards Program, established in 1973, covers all aspects of
semiconductor process equipment and materials, from wafer manufacturing to
test, assembly and packaging, in addition to the manufacture of flat panel
displays and micro-electromechanical systems (MEMS). About 1,500 volunteers
worldwide participate in the program, which is made up of 17 global
technical committees. Visit http://www.semi.org/standards for further details
about SEMI Standards.
    SEMI is a global industry association serving companies that provide
equipment, materials and services used to manufacture semiconductors,
displays, nano-scaled structures, micro-electromechanical systems (MEMS)
and related technologies. SEMI maintains offices in Austin, Beijing,
Brussels, Hsinchu, Moscow, San Jose (Calif.), Seoul, Shanghai, Singapore,
Tokyo and Washington, D.C. For more information, visit http://www.semi.org.
SOURCE SEMI
http://www.semi.org/
CONTACT:
Bettina Weiss, +1-408-943-6998, or
bweiss@semi.org, or Scott Smith, +1-408-943-7957, or
smith@semi.org, both of SEMI