Documents Include Guidelines for FPD Manufacturing, SOI Wafers
SAN JOSE, Calif., June 11 /PRNewswire/ -- SEMI has published six new
technical standards applicable to the semiconductor, flat panel display
(FPD) and MEMS manufacturing industries. The new standards, developed by
technical experts from equipment and materials suppliers, device
manufacturers and other companies participating in the SEMI International
Standards Program, are available for purchase in CD-ROM format or can be
downloaded from the SEMI website, http://www.semi.org.
SEMI Standards are published three times a year. The new standards,
part of the June 2007 publication cycle, join more than 740 standards that
have been published by SEMI during the past 34 years.
"These new SEMI standards, which include specifications for the flat
panel display (FPD) manufacturing industry, are the result of
collaborative, consensus-driven efforts among industry experts --
competitors and customers alike -- to manage the ever increasing
manufacturing challenges, improve yield and ensure compatibility of
equipment and processes worldwide," said Bettina Weiss, SEMI director of
International Standards.
The standards released today include specifications for bar code
container identification, specifications for silicon-on-insular (SOI)
wafers, and a test method for surface hardness of FPD polarizing film. In
addition to the six new standards, SEMI revised a previously published
standard on EHS guidelines for exhaust ventilation of semiconductor
manufacturing equipment. The revised SEMI S6 offers significantly more
detailed guidance and provides equipment suppliers, evaluators and users a
means of validating the adequacy of exhaust ventilation.
The new standards released today include:
SEMI C61
Specification for Bar-Code Container Identification
SEMI D49
Specification of Single Substrate Orientation for Loading/Unloading
Into/From Equipment to Specify ID Reader Position
SEMI D50
Test Method for Surface Hardness of FPD Polarizing Film
SEMI E148
Specification for the Definition of Time Synchronization Method and Format
SEMI E149
Guide for Documentation Provided to the Equipment User for Use with
Semiconductor Manufacturing Equipment
SEMI M71
Specification for Silicon-On-Insulator (SOI) Wafers for CMOS LSI 130 nm
Technology Generation and Beyond
The SEMI Standards Program, established in 1973, covers all aspects of
semiconductor process equipment and materials, from wafer manufacturing to
test, assembly and packaging, in addition to the manufacture of flat panel
displays and micro-electromechanical systems (MEMS). About 1,100 volunteers
worldwide participate in the program, which is made up of 17 global
technical committees. Visit http://www.semi.org/standards for further
details about SEMI Standards.
SEMI is a global industry association serving companies that provide
equipment, materials and services used to manufacture semiconductors,
displays, nano-scaled structures, micro-electromechanical systems (MEMS)
and related technologies. SEMI maintains offices in Austin, Beijing,
Brussels, Hsinchu, Moscow, San Jose (Calif.), Seoul, Shanghai, Singapore,
Tokyo and Washington, D.C. For more information, visit http://www.semi.org.
SOURCE SEMI
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Related links:
http://www.semi.org
CONTACT:
Bettina Weiss, +1-408-943-6998,
bweiss@semi.org, or Scott Smith +1-408-943-7957, smith@semi.org,
both of SEMI
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