Leading Technologies Used for Enhanced Post-CMP Wafer Cleaning, Polishing and
Guarding Against Wafer Defects
BILLERICA, Mass., July 11 /PRNewswire-FirstCall/ -- Mykrolis Corporation
(NYSE: MYK), a leading supplier of components and subsystems to the
semiconductor industry, will showcase several innovative products and
technologies from its Chemical Mechanical Planarization (CMP) division at
SEMICON West (Booth #710/South Hall) in San Francisco from July 12-14, 2005.
"The Mykrolis CMP products showcased at SEMICON West this year demonstrate
the most advanced technologies for removing large, defect-causing particles
without removing the smaller 'working' particles needed for CMP applications,"
said Christopher Wargo, director of the CMP business at Mykrolis. "By working
closely with our OEM and end-user customers, we identify ways to continuously
enhance and refine our CMP product line, helping them to meet the most
challenging needs in today's complex CMP processes."
The following product innovations from Mykrolis's CMP division will be on
display at SEMICON West this year:
* Solaris(R) DVP Dual Transducer Manifold -- Offers rapid, clean and safe
filter changeout in seconds without the use of tools, limiting the
handling of hazardous chemicals during installation and disposal
processes.
* Planarcore(R) polyvinyl acetal (PVA) brushes -- Brushes that have a
unique "integrally molded" design to provide greater consistency and
improved performance in post-CMP cleaning and polishing applications.
As a result, brush changeout is much faster and brush performance is
much more consistent.
* Planarcap(TM) -- Disposable filters provide high retention, long life
and application specific technology for CMP filtration. The Planarcap
LPX series is specifically designed to meet the challenges of silica
and alumina abrasives typically used for oxide CMP and copper CMP
applications. The Planarcap TPX series is specifically designed for
ceria applications that typically have smaller abrasive particles at
lower concentrations.
* Planargard(R) CS 0.2 -- Micron filters are designed to meet the needs of
next generation copper and ILD slurries. The filters remove only
particles that are disruptive to the CMP process. The particle size
distribution of the desired slurry particles does not change after
filtration. As a result, consistent slurry is delivered to the
process.
About Mykrolis
Mykrolis is a worldwide developer, manufacturer and supplier of liquid and
gas delivery systems, components and consumables used to precisely measure,
deliver, control and purify the process liquids, gases and chemicals, as well
as the deionized water, photoresists and vacuum systems utilized in the
semiconductor manufacturing process. In addition, the Company's products are
used to manufacture a range of other products, such as flat panel displays,
high purity chemicals, photoresists, solar cells, gas lasers, optical disks
and fiber optic cables. Based in Billerica, Massachusetts, Mykrolis is
formerly Millipore Microelectronics, Inc. For more information, visit
http://www.mykrolis.com.
Mykrolis, Solaris, Planarcore, and Planargard are registered trademarks of
Mykrolis. Planarcap and the Mykrolis logo are trademarks of Mykrolis
Corporation.
PRESS CONTACT:
Craig Lazinsky
Mykrolis Corporation
Tel. 978-436-6743
Craig_Lazinsky@mykrolis.com
SOURCE Mykrolis Corporation
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Related links:
http://www.mykrolis.com
CONTACT:
Craig Lazinsky of Mykrolis Corporation,
+1-978-436-6743, Craig_Lazinsky@mykrolis.com
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